PHILADELPHIA--(BUSINESS WIRE)--Dow Electronic Materials, a business unit of The Dow Chemical Company (NYSE:DOW), today introduced its new IKONIC™ polishing pad platform, bringing to market Dow’s most ...
AURORA, Ill., Oct. 20, 2010 (GLOBE NEWSWIRE) -- Cabot Microelectronics Corporation (Nasdaq:CCMP), the world's leading supplier of chemical mechanical planarization (CMP) polishing slurries and growing ...
BANGALORE, India, Jan. 8, 2024 /PRNewswire/ -- CMP Pads Market is Segmented by Application (300mm Wafer, 200mm Wafer), by Type (Hard Pad, Soft Pad). The Global CMP Pads Market Size is expected to ...
Dow Unveils First CMP Polishing Pads from its IKONIC™ Platform; Brings New, Advanced Materials to th
PHILADELPHIA--(BUSINESS WIRE)-- Following the introduction of its IKONIC™ chemical mechanical planarization (CMP) polishing pad platform in late 2012, Dow Electronic Materials, a business unit of The ...
Thomas West Inc. (TWI) introduced a hard chemical mechanical planarization (CMP) pad today that will put the small, privately owned Sunnyvale, Calif.-based company up against Rodel Inc., a company ...
SANTA CLARA, Calif.--(BUSINESS WIRE)--Applied Materials, Inc. today announced its innovative Applied DuraPad ™ CMP polishing pad technology for 200mm chemical mechanical planarization (CMP) systems.
Dow Electronic Materials, a unit of U.S. chemical kingpin The Dow Chemical Company ( DOW), has launched the first chemical mechanical planarization (CMP) polishing pads from its new IKONIC 2000 and ...
LONDON — Linx Consulting LLC is predicting that demand for pads and slurries will drive the annual market for chemical mechanical polishing (CMP) consumables up 12 percent to $1.23 billion in 2006, up ...
is Segmented by Application (300mm Wafer, 200mm Wafer), by Type (Hard Pad , Soft Pad ). The Global CMP Pads Market Size is expected to reach USD 1412.2 Million by 2029, growing at a CAGR of 7.7% from ...
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